ICP ANALYZING APPARATUS
专利名称：ICP ANALYZING APPARATUS 发明人：OKADA AKIRA
申请号：JP30314089
申请日：19891124
公开号：JPH03165239A
公开日：
怎么申请icp
19910717
专利内容由知识产权出版社提供
摘要：PURPOSE:To rapidly remove impurities during analysis without stopping the device by disposing an inducing means for inducing filamentary plasma from a plasma flame on the outer side of carrier gas flow passage pipe systems used for carrying of a sample into the plasma flame. CONSTITUTION:An electrode 9 connected to a high-voltage generator 11 is provided as the means for inducing the filamentary plasma from the plasma flame on the outer side of the inside pipe 2 near the sample introducing pipe 8a. Namely, this inducing means is disposed on the outer side of the carrier gas flow passage pipe systems 2, 8a used for carrying the sample into the plasma flame, by which the filamentary plasma induced by the inducing means from the plasma flame and made to exist within the carrier gas flow passage pipe systems 2, 8a is brought into reaction with th impurities sticking and remaining on the inner side of the carrier gas flow passage pipe systems 2, 8a by the high temp. and the reactivity thereof. The impurities are thus re moved.
申请人：TOSHIBA CORP
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